China Hot selling Polycold Chiller Wvcp4200 Cryochiler Vacuum Pump with Hot selling

Product Description

XIEYI -135ºC Water Vapor Capture Pump

Ultra-low energy consumption
Cold trap cooled to -135ºC
Maximum load 550-6 liters per second
Refrigeration capacity more than other models machines with the same displacement compressor
Cold trap can reach the ideal extraction speed within 3 minutes
Environmental protection, with no flammable gas

What is a cryopump?

XIEYI Water vapor capture cryo chiller (cryogenic machine), using the principle of low-temperature adsorption and capture, can effectively condense and collect 95% of the residual water vapor on the surface of the cold trap in the vacuum chamber, so that the system can quickly obtain the required vacuum degree.
They can be used in a variety of applications to improve product quality and processing speed by enabling more production in a day. Industries include thin film, semiconductor, automotive, medical, ophthalmology, food and beverage, aerospace, and defense. Application examples include automotive headlights, food packaging, and the production of jet engines.

Cold trap coil
The cold trap coil is the key direct part of trapping water vapor. It is installed in a vacuum chamber and absorbs water vapor on the surface of the pipe through the ultra-low temperature of the coil surface. Any shape of the coil can be customized according to your requirements.
The cold traps and connecting pipes of our company are all made of domestic top-quality ZheJiang Flywheel cold extruded copper tubes, welded by American Harris 56% silver brazing rods.

Cold bridge
The cold and heat bridge is mainly an isolation vacuum and heat insulation device for the cryogenic pipeline to enter the vacuum chamber. The connection of the pipeline adopts CHINAMFG CPI or Swagelok VCR connectors, and there are 2 specifications of the cold and heat bridge, 1 inch and 2 inches.
The opening diameter of the 1-inch cavity needs to be 27mm, and the opening diameter of the 2-inch cavity is 52mm. The cold and heat bridge can be customized according to the hole diameter you design.

Refrigeration connecting pipe
The length of the standard connecting pipeline is 2.44 meters, the outer diameter of the insulation pipe is 92mm, and the nylon protective braided pipe is coated to prevent damage to the insulation pipe. The 2 ends of the connecting pipe are connected to the cold trap and the trapping pump with CPI or VCR joints. It is optional to install T-type thermocouple sensors for measuring the inlet and outlet of the cold trap.

 

Technical Parameter

Model WVCP4200-S-H WVCP4200-D-H
Maximum cooling capacity(W) 4200 4200
The theory maximum pumping speed of tubular cold trap(L/S) 367500 367500
The theory maximum speed of plate cold trap(L/S) 529200 529200
Final vacuum(mbar) 2*10-8 2*10-8
Defrost time of maximum cold trap area(min) <3 <3
Adjustable range of defrost temperature(ºC) -20~30 -20~30
Pressure control mode Digital sensor+Mechanical switch Digital sensor+Mechanical switch
Quick restore balance pressure function(QRBP) Yes Yes
Oil blocking proof function(OBP) Yes Yes
4G Remote control Yes Yes
Cold media properties Pro-enviroment Pro-enviroment
Maximum surface area of tubular cold trap(m²) 2.5 2.5
Maximum surface area of plate cold trap(m²) 3.6 3.6
Specification of single cold trap(m²) φ16mm*50m /
Specification of double cold trap(m²) / 2*φ16mm*25m
Gas interface 12.7 copper welded junction(Standard) 12.7 copper welded junction(Standard)
ParkerCPI/VCR(Optional) ParkerCPI/VCR(Optional)
Cooling water flow(L/Min at 24ºC) 28 28
Cooling water alarm temperature(ºC) 38 38
Cooling tower Yes Yes
Cooling water connector(L/S) G3/4 G3/4
Maximum load power(kW) 16.5 16.5
Compressor nominal power(HP) 10 10
Power supply(50HZ) 380-400V AC 3P(H) 380-400V AC 3P(H)
200-230V AC 3P(L) 200-230V AC 3P(L)
Dimension(MM) 935(L)*873(D)*1809(H) 935(L)*873(D)*1809(H)
Weight(KG) 555 555

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After-sales Service: Online&on The Field&Video Support
Warranty: 24months
Oil or Not: Oil
Customization:
Available

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Currency: US$
Return&refunds: You can apply for a refund up to 30 days after receipt of the products.

vacuum pump

What Is the Role of Vacuum Pumps in Semiconductor Manufacturing?

Vacuum pumps play a critical role in semiconductor manufacturing processes. Here’s a detailed explanation:

Semiconductor manufacturing involves the production of integrated circuits (ICs) and other semiconductor devices used in various electronic applications. Vacuum pumps are used extensively throughout the semiconductor manufacturing process to create and maintain the required vacuum conditions for specific manufacturing steps.

Here are some key roles of vacuum pumps in semiconductor manufacturing:

1. Deposition Processes: Vacuum pumps are used in deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). These processes involve depositing thin films of materials onto semiconductor wafers to create various layers and patterns. Vacuum pumps help create a low-pressure environment necessary for precise control of the deposition process, ensuring uniform and high-quality film formation.

2. Etching and Cleaning: Vacuum pumps are utilized in etching and cleaning processes, which involve the removal of specific layers or contaminants from semiconductor wafers. Dry etching techniques, such as plasma etching and reactive ion etching, require a vacuum environment to facilitate the ionization and removal of material. Vacuum pumps aid in creating the necessary low-pressure conditions for efficient etching and cleaning processes.

3. Ion Implantation: Ion implantation is a process used to introduce impurities into specific regions of a semiconductor wafer to modify its electrical properties. Vacuum pumps are used to evacuate the ion implantation chamber, creating the required vacuum environment for accurate and controlled ion beam acceleration and implantation.

4. Wafer Handling and Transfer: Vacuum pumps are employed in wafer handling and transfer systems. These systems utilize vacuum suction to securely hold and manipulate semiconductor wafers during various manufacturing steps, such as loading and unloading from process chambers, robotic transfer between tools, and wafer alignment.

5. Load Lock Systems: Load lock systems are used to transfer semiconductor wafers between atmospheric conditions and the vacuum environment of process chambers. Vacuum pumps are integral components of load lock systems, creating and maintaining the vacuum conditions necessary for wafer transfer while minimizing contamination risks.

6. Metrology and Inspection: Vacuum pumps are utilized in metrology and inspection tools used for characterizing semiconductor devices. These tools, such as scanning electron microscopes (SEMs) and focused ion beam (FIB) systems, often operate in a vacuum environment to enable high-resolution imaging and accurate analysis of semiconductor structures and defects.

7. Leak Detection: Vacuum pumps are employed in leak detection systems to identify and locate leaks in vacuum chambers, process lines, and other components. These systems rely on vacuum pumps to evacuate the system and then monitor for any pressure rise, indicating the presence of leaks.

8. Cleanroom Environment Control: Semiconductor manufacturing facilities maintain cleanroom environments to prevent contamination during the fabrication process. Vacuum pumps are used in the design and operation of the cleanroom ventilation and filtration systems, helping to maintain the required air cleanliness levels by removing particulates and maintaining controlled air pressure differentials.

Vacuum pumps used in semiconductor manufacturing processes are often specialized to meet the stringent requirements of the industry. They need to provide high vacuum levels, precise control, low contamination levels, and reliability for continuous operation.

Overall, vacuum pumps are indispensable in semiconductor manufacturing, enabling the creation of the necessary vacuum conditions for various processes, ensuring the production of high-quality semiconductor devices.

vacuum pump

Can Vacuum Pumps Be Used for Chemical Distillation?

Yes, vacuum pumps are commonly used in chemical distillation processes. Here’s a detailed explanation:

Chemical distillation is a technique used to separate or purify components of a mixture based on their different boiling points. The process involves heating the mixture to evaporate the desired component and then condensing the vapor to collect the purified substance. Vacuum pumps play a crucial role in chemical distillation by creating a reduced pressure environment, which lowers the boiling points of the components and enables distillation at lower temperatures.

Here are some key aspects of using vacuum pumps in chemical distillation:

1. Reduced Pressure: By creating a vacuum or low-pressure environment in the distillation apparatus, vacuum pumps lower the pressure inside the system. This reduction in pressure lowers the boiling points of the components, allowing distillation to occur at temperatures lower than their normal boiling points. This is particularly useful for heat-sensitive or high-boiling-point compounds that would decompose or become thermally degraded at higher temperatures.

2. Increased Boiling Point Separation: Vacuum distillation increases the separation between the boiling points of the components, making it easier to achieve a higher degree of purification. In regular atmospheric distillation, the boiling points of some components may overlap, leading to less effective separation. By operating under vacuum, the boiling points of the components are further apart, improving the selectivity and efficiency of the distillation process.

3. Energy Efficiency: Vacuum distillation can be more energy-efficient compared to distillation under atmospheric conditions. The reduced pressure lowers the required temperature for distillation, resulting in reduced energy consumption and lower operating costs. This is particularly advantageous when dealing with large-scale distillation processes or when distilling heat-sensitive compounds that require careful temperature control.

4. Types of Vacuum Pumps: Different types of vacuum pumps can be used in chemical distillation depending on the specific requirements of the process. Some commonly used vacuum pump types include:

– Rotary Vane Pumps: Rotary vane pumps are widely used in chemical distillation due to their ability to achieve moderate vacuum levels and handle various gases. They work by using rotating vanes to create chambers that expand and contract, enabling the pumping of gas or vapor.

– Diaphragm Pumps: Diaphragm pumps are suitable for smaller-scale distillation processes. They use a flexible diaphragm that moves up and down to create a vacuum and compress the gas or vapor. Diaphragm pumps are often oil-free, making them suitable for applications where avoiding oil contamination is essential.

– Liquid Ring Pumps: Liquid ring pumps can handle more demanding distillation processes and corrosive gases. They rely on a rotating liquid ring to create a seal and compress the gas or vapor. Liquid ring pumps are commonly used in chemical and petrochemical industries.

– Dry Screw Pumps: Dry screw pumps are suitable for high-vacuum distillation processes. They use intermeshing screws to compress and transport gas or vapor. Dry screw pumps are known for their high pumping speeds, low noise levels, and oil-free operation.

Overall, vacuum pumps are integral to chemical distillation processes as they create the necessary reduced pressure environment that enables distillation at lower temperatures. By using vacuum pumps, it is possible to achieve better separation, improve energy efficiency, and handle heat-sensitive compounds effectively. The choice of vacuum pump depends on factors such as the required vacuum level, the scale of the distillation process, and the nature of the compounds being distilled.

vacuum pump

How Do You Choose the Right Size Vacuum Pump for a Specific Application?

Choosing the right size vacuum pump for a specific application involves considering several factors to ensure optimal performance and efficiency. Here’s a detailed explanation:

1. Required Vacuum Level: The first consideration is the desired vacuum level for your application. Different applications have varying vacuum level requirements, ranging from low vacuum to high vacuum or even ultra-high vacuum. Determine the specific vacuum level needed, such as microns of mercury (mmHg) or pascals (Pa), and choose a vacuum pump capable of achieving and maintaining that level.

2. Pumping Speed: The pumping speed, also known as the displacement or flow rate, is the volume of gas a vacuum pump can remove from a system per unit of time. It is typically expressed in liters per second (L/s) or cubic feet per minute (CFM). Consider the required pumping speed for your application, which depends on factors such as the volume of the system, the gas load, and the desired evacuation time.

3. Gas Load and Composition: The type and composition of the gas or vapor being pumped play a significant role in selecting the right vacuum pump. Different pumps have varying capabilities and compatibilities with specific gases. Some pumps may be suitable for pumping only non-reactive gases, while others can handle corrosive gases or vapors. Consider the gas load and its potential impact on the pump’s performance and materials of construction.

4. Backing Pump Requirements: In some applications, a vacuum pump may require a backing pump to reach and maintain the desired vacuum level. A backing pump provides a rough vacuum, which is then further processed by the primary vacuum pump. Consider whether your application requires a backing pump and ensure compatibility and proper sizing between the primary pump and the backing pump.

5. System Leakage: Evaluate the potential leakage in your system. If your system has significant leakage, you may need a vacuum pump with a higher pumping speed to compensate for the continuous influx of gas. Additionally, consider the impact of leakage on the required vacuum level and the pump’s ability to maintain it.

6. Power Requirements and Operating Cost: Consider the power requirements of the vacuum pump and ensure that your facility can provide the necessary electrical supply. Additionally, assess the operating cost, including energy consumption and maintenance requirements, to choose a pump that aligns with your budget and operational considerations.

7. Size and Space Constraints: Take into account the physical size of the vacuum pump and whether it can fit within the available space in your facility. Consider factors such as pump dimensions, weight, and the need for any additional accessories or support equipment.

8. Manufacturer’s Recommendations and Expert Advice: Consult the manufacturer’s specifications, guidelines, and recommendations for selecting the right pump for your specific application. Additionally, seek expert advice from vacuum pump specialists or engineers who can provide insights based on their experience and knowledge.

By considering these factors and evaluating the specific requirements of your application, you can select the right size vacuum pump that meets the desired vacuum level, pumping speed, gas compatibility, and other essential criteria. Choosing the appropriate vacuum pump ensures efficient operation, optimal performance, and longevity for your application.

China Hot selling Polycold Chiller Wvcp4200 Cryochiler Vacuum Pump   with Hot selling	China Hot selling Polycold Chiller Wvcp4200 Cryochiler Vacuum Pump   with Hot selling
editor by CX 2024-01-30