Product Description
Product Parameters
Model | VRD-4 | VRD-8 | VRD-16 | VRD-24 | VRD-30 | VRD-48 | VRD-65 | VRD-90 | |
Pumping Speed | 50HZ m3/h(L/S) | 4(1.1) | 8(2.2) | 16(4.4) | 24(6.6) | 30(8.3) | 48(13.3) | 65(18) | 85(23.6) |
60HZ m3/h(L/S) | 4.8(1.3 | 9.6(2.6) | 19.2(5.2) | 28.8(7.9) | 36(9.9) | 57.6(16) | 78(21.6) | 102(28.3) | |
Ultimate Partial Pressure Gas Ballast Close(Pa) | 5×10-2 | 5×10-2 | 4×10-2 | 4×10-2 | 4×10-2 | 4×10-2 | 4×10-2 | 4×10-2 | |
Ultimate Total Pressure Gas Ballast Close(Pa) | 5×10-1 | 5×10-1 | 4×10-1 | 4×10-1 | 4×10-1 | 4×10-1 | 4×10-1 | 4×10-1 | |
Ultimate Total Pressure Gas Ballast Open(Pa) | 10 | 10 | 8×10-1 | 8×10-1 | 8×10-1 | 1.5 | 1.5 | 1.5 | |
Power Supply | Single/3 phase | 3 phase | |||||||
Power(kw) | 0.4/0.37 | 0.4/0.37 | 0.55 | 0.75 | 1.1 | 1.5 | 2.2 | 3 | |
Level of Protection | IP44 | IP44 | IP44 | IP44 | IP44 | IP44 | IP44 | IP44 | |
Air Intake/Exhaust Port | KF16/25 | KF16/25 | KF25 | KF25/40 | KF25/40 | KF40 | KF40 | KF40 | |
Oil Mass(L) | 0.6-1.0 | 0.6-1.0 | 0.9-1.5 | 1.3-2.0 | 1.3-2.0 | 3.3-4.5 | 3.3-4.5 | 3.3-4.5 | |
Motor Speed 50/60Hz(rpm) | 1440/1720 | 1440/1720 | 1440/1720 | 1440/1720 | 1440/1720 | 1440/1720 | 1440/1720 | 1440/1720 | |
Ambient Temperature(ºC) | 10-40 | 10-40 | 10-40 | 10-40 | 10-40 | 10-40 | 10-40 | 10-40 | |
Noise Level(dB) | ≤52 | ≤52 | ≤58 | ≤58 | ≤58 | ≤62 | ≤62 | ≤65 | |
Weight(kg) | 19 | 21 | 30 | 35 | 43 | 62 | 65 | 65 | |
Size(L*W*H mm) | 440*144*217 | 440*144*217 | 530*188*272 | 567*188*272 | 567*188*272 | 730*234*358 | 730*234*358 | 730*234*358 |
Product Description
“BOTH” VRD series pumps are designed for reliable long time continuous operation, they will take your equipment’s vacuum down to 0.3 CHINAMFG in minutes. Comes standard with all necessary fittings and a high capacity exhaust oil mist filter which also returns trapped pump oil back to the pump and makes the pump quieter to run. Multi-level gas ballast is designed to allow purposefully pull a less deep and slower vacuum by opening the gas ballast, allowing dry air to go directly into the pump and diluting the vacuum pull, and it also helps keep moisture, solvent, and other contaminants from getting stuck in the pump, and instead passing through to the exhaust. It is important to note that pumps should always be ran in a well ventilated area
· Tow-Shift adjustable gas ballast valve satisfies different requirements of condensable vapor(such as water vapor) to be exhausted
· Out of pump in different processes. Dual protection of oil anti-sucking back ensures vacuum system from oil pollution when pump
· Stops running and needs to be easily restarted. Forced oil circulation system consisted of oil pump and constant pressure oil supply mechanism ensures stable running of the pump.
· Less components are used, easy to maintain and repair
Application
· Rotary Vane Vacuum Pump corollary use with freezer dryer to reach vacuum state, it’s an essential corollary equipment in medicine CHINAMFG drying, biology, food industry and agricultural products deep processing
· Rotary Vane Vacuum Pump corollary use with vacuum drying oven for maintaining vacuum state inside the oven, they mainly applies in powder drying and baking in vacuum condition
Company Profile
Packaging & Shipping
FAQ
Q1. What is your products range?
• Industry water chiller, recirculating cooling chiller, rotary evaporator, alcohol recovery equipment, short path distillation kit, glass molecular distillation equipment, falling film evaporator, jacketed glass reactor and other lab equipment.
Q2. Are you trading company or manufacturer?
• We are professional manufacture of lab equipment and we have our own factory.
Q3. Do you provide samples? Is it free?
• Yes, we could offer the sample. Considering the high value of our products, the sample is not free, but we will give you our best price including shipping cost.
Q4. Do you have warranty?
• Yes, we offer 1 year warranty for the spare part.
Q5. How long is your delivery time?
• Generally it is within 7 working days after receiving the payment if the goods are in stock. Or it is 15 working days if thegoods are not in stock, depending on order quantity.
Q6. What is your terms of payment?
• Payment≤15,000USD, 100% in advance. Payment≥15,000USD, 70% T/T in advance, balance before shipment.
(If you are concerned about payment security for the first order, we advise you can place Trade Assurance Order via Alibaba. you will get 100% payment refund if we can’t meet agreed delivery time.)
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After-sales Service: | Online Service Support |
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Warranty: | 2 Year |
Oil or Not: | Oil |
Customization: |
Available
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Shipping Cost:
Estimated freight per unit. |
about shipping cost and estimated delivery time. |
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Payment Method: |
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Initial Payment Full Payment |
Currency: | US$ |
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Return&refunds: | You can apply for a refund up to 30 days after receipt of the products. |
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What Is the Role of Vacuum Pumps in Semiconductor Manufacturing?
Vacuum pumps play a critical role in semiconductor manufacturing processes. Here’s a detailed explanation:
Semiconductor manufacturing involves the production of integrated circuits (ICs) and other semiconductor devices used in various electronic applications. Vacuum pumps are used extensively throughout the semiconductor manufacturing process to create and maintain the required vacuum conditions for specific manufacturing steps.
Here are some key roles of vacuum pumps in semiconductor manufacturing:
1. Deposition Processes: Vacuum pumps are used in deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). These processes involve depositing thin films of materials onto semiconductor wafers to create various layers and patterns. Vacuum pumps help create a low-pressure environment necessary for precise control of the deposition process, ensuring uniform and high-quality film formation.
2. Etching and Cleaning: Vacuum pumps are utilized in etching and cleaning processes, which involve the removal of specific layers or contaminants from semiconductor wafers. Dry etching techniques, such as plasma etching and reactive ion etching, require a vacuum environment to facilitate the ionization and removal of material. Vacuum pumps aid in creating the necessary low-pressure conditions for efficient etching and cleaning processes.
3. Ion Implantation: Ion implantation is a process used to introduce impurities into specific regions of a semiconductor wafer to modify its electrical properties. Vacuum pumps are used to evacuate the ion implantation chamber, creating the required vacuum environment for accurate and controlled ion beam acceleration and implantation.
4. Wafer Handling and Transfer: Vacuum pumps are employed in wafer handling and transfer systems. These systems utilize vacuum suction to securely hold and manipulate semiconductor wafers during various manufacturing steps, such as loading and unloading from process chambers, robotic transfer between tools, and wafer alignment.
5. Load Lock Systems: Load lock systems are used to transfer semiconductor wafers between atmospheric conditions and the vacuum environment of process chambers. Vacuum pumps are integral components of load lock systems, creating and maintaining the vacuum conditions necessary for wafer transfer while minimizing contamination risks.
6. Metrology and Inspection: Vacuum pumps are utilized in metrology and inspection tools used for characterizing semiconductor devices. These tools, such as scanning electron microscopes (SEMs) and focused ion beam (FIB) systems, often operate in a vacuum environment to enable high-resolution imaging and accurate analysis of semiconductor structures and defects.
7. Leak Detection: Vacuum pumps are employed in leak detection systems to identify and locate leaks in vacuum chambers, process lines, and other components. These systems rely on vacuum pumps to evacuate the system and then monitor for any pressure rise, indicating the presence of leaks.
8. Cleanroom Environment Control: Semiconductor manufacturing facilities maintain cleanroom environments to prevent contamination during the fabrication process. Vacuum pumps are used in the design and operation of the cleanroom ventilation and filtration systems, helping to maintain the required air cleanliness levels by removing particulates and maintaining controlled air pressure differentials.
Vacuum pumps used in semiconductor manufacturing processes are often specialized to meet the stringent requirements of the industry. They need to provide high vacuum levels, precise control, low contamination levels, and reliability for continuous operation.
Overall, vacuum pumps are indispensable in semiconductor manufacturing, enabling the creation of the necessary vacuum conditions for various processes, ensuring the production of high-quality semiconductor devices.
How Do Vacuum Pumps Affect the Performance of Vacuum Chambers?
When it comes to the performance of vacuum chambers, vacuum pumps play a critical role. Here’s a detailed explanation:
Vacuum chambers are enclosed spaces designed to create and maintain a low-pressure environment. They are used in various industries and scientific applications, such as manufacturing, research, and material processing. Vacuum pumps are used to evacuate air and other gases from the chamber, creating a vacuum or low-pressure condition. The performance of vacuum chambers is directly influenced by the characteristics and operation of the vacuum pumps used.
Here are some key ways in which vacuum pumps affect the performance of vacuum chambers:
1. Achieving and Maintaining Vacuum Levels: The primary function of vacuum pumps is to create and maintain the desired vacuum level within the chamber. Vacuum pumps remove air and other gases, reducing the pressure inside the chamber. The efficiency and capacity of the vacuum pump determine how quickly the desired vacuum level is achieved and how well it is maintained. High-performance vacuum pumps can rapidly evacuate the chamber and maintain the desired vacuum level even when there are gas leaks or continuous gas production within the chamber.
2. Pumping Speed: The pumping speed of a vacuum pump refers to the volume of gas it can remove from the chamber per unit of time. The pumping speed affects the rate at which the chamber can be evacuated and the time required to achieve the desired vacuum level. A higher pumping speed allows for faster evacuation and shorter cycle times, improving the overall efficiency of the vacuum chamber.
3. Ultimate Vacuum Level: The ultimate vacuum level is the lowest pressure that can be achieved in the chamber. It depends on the design and performance of the vacuum pump. Higher-quality vacuum pumps can achieve lower ultimate vacuum levels, which are important for applications requiring higher levels of vacuum or for processes that are sensitive to residual gases.
4. Leak Detection and Gas Removal: Vacuum pumps can also assist in leak detection and gas removal within the chamber. By continuously evacuating the chamber, any leaks or gas ingress can be identified and addressed promptly. This ensures that the chamber maintains the desired vacuum level and minimizes the presence of contaminants or unwanted gases.
5. Contamination Control: Some vacuum pumps, such as oil-sealed pumps, use lubricating fluids that can introduce contaminants into the chamber. These contaminants may be undesirable for certain applications, such as semiconductor manufacturing or research. Therefore, the choice of vacuum pump and its potential for introducing contaminants should be considered to maintain the required cleanliness and purity of the vacuum chamber.
6. Noise and Vibrations: Vacuum pumps can generate noise and vibrations during operation, which can impact the performance and usability of the vacuum chamber. Excessive noise or vibrations can interfere with delicate experiments, affect the accuracy of measurements, or cause mechanical stress on the chamber components. Selecting vacuum pumps with low noise and vibration levels is important for maintaining optimal chamber performance.
It’s important to note that the specific requirements and performance factors of a vacuum chamber can vary depending on the application. Different types of vacuum pumps, such as rotary vane pumps, dry pumps, or turbomolecular pumps, offer varying capabilities and features that cater to specific needs. The choice of vacuum pump should consider factors such as the desired vacuum level, pumping speed, ultimate vacuum, contamination control, noise and vibration levels, and compatibility with the chamber materials and gases used.
In summary, vacuum pumps have a significant impact on the performance of vacuum chambers. They enable the creation and maintenance of the desired vacuum level, affect the pumping speed and ultimate vacuum achieved, assist in leak detection and gas removal, and influence contamination control. Careful consideration of the vacuum pump selection ensures optimal chamber performance for various applications.
How Are Vacuum Pumps Different from Air Compressors?
Vacuum pumps and air compressors are both mechanical devices used to manipulate air and gas, but they serve opposite purposes. Here’s a detailed explanation of their differences:
1. Function:
– Vacuum Pumps: Vacuum pumps are designed to remove or reduce the pressure within a closed system, creating a vacuum or low-pressure environment. They extract air or gas from a chamber, creating suction or negative pressure.
– Air Compressors: Air compressors, on the other hand, are used to increase the pressure of air or gas. They take in ambient air or gas and compress it, resulting in higher pressure and a compacted volume of air or gas.
2. Pressure Range:
– Vacuum Pumps: Vacuum pumps are capable of generating pressures below atmospheric pressure or absolute zero pressure. The pressure range typically extends into the negative range, expressed in units such as torr or pascal.
– Air Compressors: Air compressors, on the contrary, operate in the positive pressure range. They increase the pressure above atmospheric pressure, typically measured in units like pounds per square inch (psi) or bar.
3. Applications:
– Vacuum Pumps: Vacuum pumps have various applications where the creation of a vacuum or low-pressure environment is required. They are used in processes such as vacuum distillation, vacuum drying, vacuum packaging, and vacuum filtration. They are also essential in scientific research, semiconductor manufacturing, medical suction devices, and many other industries.
– Air Compressors: Air compressors find applications where compressed air or gas at high pressure is needed. They are used in pneumatic tools, manufacturing processes, air conditioning systems, power generation, and inflating tires. Compressed air is versatile and can be employed in numerous industrial and commercial applications.
4. Design and Mechanism:
– Vacuum Pumps: Vacuum pumps are designed to create a vacuum by removing air or gas from a closed system. They may use mechanisms such as positive displacement, entrapment, or momentum transfer to achieve the desired vacuum level. Examples of vacuum pump types include rotary vane pumps, diaphragm pumps, and diffusion pumps.
– Air Compressors: Air compressors are engineered to compress air or gas, increasing its pressure and decreasing its volume. They use mechanisms like reciprocating pistons, rotary screws, or centrifugal force to compress the air or gas. Common types of air compressors include reciprocating compressors, rotary screw compressors, and centrifugal compressors.
5. Direction of Air/Gas Flow:
– Vacuum Pumps: Vacuum pumps draw air or gas into the pump and then expel it from the system, creating a vacuum within the chamber or system being evacuated.
– Air Compressors: Air compressors take in ambient air or gas and compress it, increasing its pressure and storing it in a tank or delivering it directly to the desired application.
While vacuum pumps and air compressors have different functions and operate under distinct pressure ranges, they are both vital in various industries and applications. Vacuum pumps create and maintain a vacuum or low-pressure environment, while air compressors compress air or gas to higher pressures for different uses and processes.
editor by CX 2024-04-10